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Provided as a femtosecond light source that can freely use only the oscillators of the PHAROS series. Robust and industrial-grade mechanical design.
Equipped with the second harmonic wave (515nm) option (HG-FLINT) and capable of automatic switching. It can be widely used in time-resolved spectroscopy, nonlinear optics, and microstructure processing, among other applications.
A unibody design industrial-grade high-power femtosecond laser that integrates everything from the oscillator to the amplifier into a single housing.
The high-efficiency cavity design dramatically reduces the size. It is also easy to assemble and optimized for mass production, making it ideal for industrial applications as well as scientific applications. In industrial applications that require ultra-fast pulses with beam stability, the built-in pulse picker allows for control of output and energy, enabling stable beam quality and output stability unaffected by environmental conditions. By adding a flexible and highly adaptable BiBurst function, new high-tech manufacturing industries (such as home appliances, IC chip manufacturing, stent cutting, surface functionalization, next-generation display factories, quantum computers, etc.) can be provided with new solutions for micromachining applications. Scalability in material processing: High-precision microfabrication is possible for various applications such as drilling and cutting of metals, ceramics, sapphire, and glass, material ablation for mass spectrometry, internal processing for IC chip manufacturing, and processing of multilayer structured materials. The I-OPA is an industrial-grade optical parametric amplifier that can be directly attached to CARBIDE. It allows for flexible wavelength tuning and is used for spectroscopic analysis and microspectroscopy, making it ideal for multiphoton microscopy.
A high pulse repetition rate and high peak power industrial-grade DPSS picosecond laser, suitable for long life and extended use due to diode excitation.
A compact design that is robust and hermetically sealed, making it suitable for various industrial material processing. ● Wavelength: 1064nm, harmonic options (532/355nm) ● Output: 10–40W@1064nm, 8–25W@532nm, 5–15W@355nm ● Maximum pulse energy: 130μJ@100kHz, 50μJ@800kHz ● Pulse repetition: 100kHz–2MHz ● Pulse width: <10–15ps@1064nm ● Excellent focusing characteristics: M2 <1.3 ● Compact and sealed robust package design ● Fully removable and closely connected structure ● Burst mode compatible ● Equipped with process shutter Applications ■ Cutting and drilling of brittle and transparent materials ■ Micromachining ■ Thin film processing ■ Patterning
Developed for industrial processing, it features easy operation and achieves long-term maintenance-free performance, maintaining high stability with a robust casing even in a 24/7 operating environment.
High power can be obtained at high repetition rates (kHz), making it suitable for various applications such as laser ablation and micromachining. ■ Drilling and metal microparticle processing ■ Cutting ■ Patterning (semiconductors, PC boards) ■ Surface microstructures ■ Ablation ■ Micromachining ■ Solar power panels Applications (UV) ■ Cutting of OLEDs ■ Structural processing of sapphire ■ Micromachining of ceramics
This is a sub-nanosecond microchip laser with a simple structure that covers a wide range of wavelengths from small, low-cost IR (1550nm) to DUV (213nm).
We specialize in fine processing with minimal thermal impact using short pulses. Despite high output, it is adopted in analyzers as an alternative to flash lamp-excited lasers and as a substitute for expensive CW-type UV lasers, while maintaining low noise. 【Application Examples】 - Glass marking - Microdissection of biological cells - Diffraction color marking - Laser-excited fluorescence analysis - PCB repair - Multiphoton excitation - FPD repair - Gas sensing - Fine processing - Temperature sensing For more details, please contact us or download the catalog.
